Influence of Different Nitrogen Plasmas Exposures of H‐Diamond (100) Surfaces on Ambient Oxygen Adsorption, Nitrogen Bonding and Thermal Stability Studied by X‐Ray Photoelectron Spectroscopy

This study reports on the influence of nitrogen plasma exposure H-diamond (100) adsorption adventitious oxygen, bonding, and thermal stability studied by X-ray photoelectron spectroscopy. The nitrogen-plasma exposures include microwave (MW) radio frequency (RF) (at pressures: 3×10-2 (damaging) 7×10-2 Torr (non-damaging)) plasmas. largest amount oxygen ambient occurs damaging RF(N2) (O=2.8 at.%) exposed surface, whereas for MW(N2) (O=0.8 non-damaging (O=1.3 surfaces, a lower concentration is observed. Also, highest level structural damage to upper atomic layers diamond induced RF(N2), followed MW(N2). Thus, near-surface interaction promotes (in various bonding configurations, including COx C–NOx). For processed adsorbed mainly in C–N/C=N state. Whereas, non-damaging- damaging- treated bonded mixed C≡N states alongside small C–NOx component depending degree surface defects. exhibits than other cases. article protected copyright. All rights reserved.